CrSi Sputtering Targets

Formula：

CrSi

Application

Material : Cr+Si

Size : Dia.127 x 11mm; Cr:Si 90/10 at% or according to customer requirements

Density(g/cm3) :

Refractive Index :

Form : Round, Tube

Purity : 2N, 3N

Application : Electronic semiconductor industry coating, magnetron sputtering

Process : HIP

Grain size≤100μm

Thermal conductivity: 60, 100W/m.K

Coefficient of thermal expansion:8×10-6

LEAD OPTIMA ELEMENT TECH

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