ITO Rotating Sputtering Target

CAS No：	50926-11-9
Formula：	In2O3.x(SnO2)

Application

Material : In2O3+SnO2

Size : ID:133-138mm; OD: 151-169mm; L: 150-260mm or according to the customer's requirements

Density(g/cm3) : Relative density: ≥ 99.5%

Refractive Index : Resistivity ≤1.6X10-4 Ω·cm

Form : Black tube

Purity : 4N

Application : ITO conductive film, LCD, LED, etc

Production process of ITO target:

1. Hot isostatic pressing method

2. Hot pressing method

3. Sintering method

LEAD OPTIMA ELEMENT TECH

Web：www.loptima.com E-mail: sales@loptima.com Tel:（+86）18-423-717-818

Add: No.5, Huoju Avenue, Jiulong High Tech Park (China Chongqing Pilot Free Trade Zone, Erlang area), CQ 400080 China