SiO2 Sputtering Targets

SiO2 Sputtering Targets

CAS No： 14808-60-7
Formula： SiO2
Application

For optical coating, vacuum coating, sputtering target material, magnetic film, electronic material, alloy material, etc.

Name

Silicon Dioxide Target

Purity

99.99%

Size

Φ255.6×12.7mm or customized

Density

2.4g/cm3

Melting point

1670℃
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